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Please use this identifier to cite or link to this item: http://dx.doi.org/10.25673/4460
Title: Plasma-assisted atomic layer deposition for microelectronics applications
Author(s): Amusan, Akinwumi Abimbola
Advisor(s): Burte, Edmund P.
Edelmann, Frank T.
Granting Institution: Otto-von-Guericke-Universität Magdeburg
Issue Date: 2016
Extent: 1 Online-Ressource (PDF-Datei: xviii, 170 Blätter, 28,64 MB)
Type: Hochschulschrift
Language: English
Publisher: Otto von Guericke University Library, Magdeburg, Germany
URN: urn:nbn:de:gbv:ma9:1-8379
URI: https://opendata.uni-halle.de//handle/1981185920/12174
http://dx.doi.org/10.25673/4460
Open access: Open access publication
Appears in Collections:Fakultät für Elektrotechnik und Informationstechnik

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