Please use this identifier to cite or link to this item: http://dx.doi.org/10.25673/101660
Title: Defect-induced magnetism in homoepitaxial SrTiO3
Author(s): Rata, DianaLook up in the Integrated Authority File of the German National Library
Herrero-Martin, J.
Maznichenko, Igor V.
Chiabrera, F. M.
Dahm, R. T.
Ostanin, S.
Lee, D.
Jalan, B.
Buczek, Paweł AdamLook up in the Integrated Authority File of the German National Library
Mertig, IngridLook up in the Integrated Authority File of the German National Library
Ernst, A.
Ionescu, A. M.
Dörr, KathrinLook up in the Integrated Authority File of the German National Library
Pryds, NiniLook up in the Integrated Authority File of the German National Library
Park, Dae-Sung
Issue Date: 2022
Type: Article
Language: English
Abstract: Along with recent advancements in thin-film technologies, the engineering of complex transition metal oxide heterostructures offers the possibility of creating novel and tunable multifunctionalities. A representative complex oxide is the perovskite strontium titanate (STO), whose bulk form is nominally a centrosymmetric paraelectric band insulator. By tuning the electron doping, chemical stoichiometry, strain, and charge defects of STO, it is possible to control the electrical, magnetic, and thermal properties of such structures. Here, we demonstrate tunable magnetism in atomically engineered STO thin films grown on STO (001) substrates by controlling the atomic charge defects of titanium (VTi) and oxygen (VO) vacancies. Our results show that the magnetism can be tuned by altering the growth conditions. We provide deep insights into its association to the following defect types: (i) VTi, resulting in a charge rearrangement and local spin polarization, (ii) VO, leading to weak magnetization, and (iii) VTi–VO pairs, which lead to the appearance of a sizable magnetic signal. Our results suggest that controlling charged defects is critical for inducing a net magnetization in STO films. This work provides a crucial step for designing magnetic STO films via defect engineering for magnetic and spin-based electronic applications.
URI: https://opendata.uni-halle.de//handle/1981185920/103607
http://dx.doi.org/10.25673/101660
Open Access: Open access publication
License: (CC BY 4.0) Creative Commons Attribution 4.0(CC BY 4.0) Creative Commons Attribution 4.0
Journal Title: APL materials
Publisher: AIP Publ.
Publisher Place: Melville, NY
Volume: 10
Issue: 9
Original Publication: 10.1063/5.0101411
Appears in Collections:Open Access Publikationen der MLU

Files in This Item:
File Description SizeFormat 
5.0101411.pdf8.67 MBAdobe PDFThumbnail
View/Open