Please use this identifier to cite or link to this item:
http://dx.doi.org/10.25673/119294| Title: | Optical second- and third-order nonlinearities in plasma-enhanced chemical vapor deposition-grown silicon oxides and silicon nitrides |
| Author(s): | Wardenberg, Laurids Kühling, André Schilling, Jörg  |
| Issue Date: | 2025 |
| Type: | Article |
| Language: | English |
| URI: | https://opendata.uni-halle.de//handle/1981185920/121252 http://dx.doi.org/10.25673/119294 |
| Open Access: |  Open access publication |
| License: |  (CC BY 4.0) Creative Commons Attribution 4.0 |
| Journal Title: | Advanced photonics research |
| Publisher: | Wiley-VCH |
| Publisher Place: | Weinheim |
| Volume: | 6 |
| Issue: | 5 |
| Original Publication: | 10.1002/adpr.202400142 |
| Page Start: | 1 |
| Page End: | 8 |
| Appears in Collections: | Open Access Publikationen der MLU |
Files in This Item:
| File | Description | Size | Format | |
|---|---|---|---|---|
| adpr-202400142.pdf | 1.42 MB | Adobe PDF |  View/Open |