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Titel: Three-dimensional topological orbital Hall effect caused by magnetic hopfions
Autor(en): Göbel, BörgeIn der Gemeinsamen Normdatei der DNB nachschlagen
Lounis, SamirIn der Gemeinsamen Normdatei der DNB nachschlagen
Erscheinungsdatum: 2025
Art: Artikel
Sprache: Englisch
Zusammenfassung: Magnetic hopfions are noncollinear spin textures that are characterized by an integer topological invariant, called the Hopf index. The three-dimensional magnetic solitons can be thought of as a tube with a twisted magnetization that has been closed at both ends to form a torus. The tube consists of a magnetic whirl called an in-plane skyrmion or bimeron. Although hopfions have been observed by microscopy techniques, their detection remains challenging as they lack an electronic hallmark so far. Here we predict a three-dimensional orbital Hall effect caused by hopfion textures: When an electric field is applied, the hopfion generates a transverse current of orbital angular momentum. The effect arises due to the local emergent field that gives rise to in-plane and out-of-plane orbital Hall conductivities. This orbital Hall response can be seen as a hallmark of hopfions and allows us to distinguish them from other textures, such as skyrmioniums, that look similar in real-space microscopy experiments. While the two-dimensional topological invariant of a skyrmion determines its topological Hall transport, the unique three-dimensional topological orbital Hall effect can be identified with the three-dimensional topological invariant that is the Hopf index. Our results make hopfions attractive for spin-orbitronic applications because their orbital signatures allow for their detection in devices and give rise to large orbital torques.
URI: https://opendata.uni-halle.de//handle/1981185920/123553
http://dx.doi.org/10.25673/121601
Open-Access: Open-Access-Publikation
Nutzungslizenz: (CC BY 4.0) Creative Commons Namensnennung 4.0 International(CC BY 4.0) Creative Commons Namensnennung 4.0 International
Journal Titel: Physical review
Verlag: Inst.
Verlagsort: Woodbury, NY
Band: 112
Originalveröffentlichung: 10.1103/sc9g-l9by
Seitenanfang: 134426
Seitenende: 1-134426-12
Enthalten in den Sammlungen:Open Access Publikationen der MLU

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